C P-LOK
Serial Number: 77192004
Word Mark: C P-LOK
Goods and Services: (ABANDONED) IC 001. US 001 005 006 010 026 046. G & S: Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris
Mark Drawing Code: (4) STANDARD CHARACTER MARK
Filing Date: 05/29/2007
Current Basis: 1B
Original Filing Basis: 1B
Type of Mark: TRADEMARK
Register: PRINCIPAL
Live/Dead Indicator: DEAD
SiteNo: 11401