(REGISTRANT) STEAG MicroTech GmbH LIMITED LIABILITY COMPANY FED REP GERMANY Carl-Benz-Strasse 10 72124 Pliezhausen FED REP GERMANY | BARRACUDA - 76075632 - Trademark Search

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Laws-info.com » Trademark » Trademarks Search » (REGISTRANT) STEAG MicroTech GmbH LIMITED LIABILITY COMPANY FED REP GERMANY Carl-Benz-Strasse 10 72124 Pliezhausen FED REP GERMANY | BARRACUDA - 76075632 - Trademark Search | Registered by Robert W. Becker

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Filing Date:

BARRACUDA

Serial Number: 76075632

Reg Number: 2648048

Word Mark: BARRACUDA

Goods and Services: (CANCELLED) IC 007. US 013 019 021 023 031 034 035. G & S: Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces

(CANCELLED) IC 037. US 100 103 106. G & S: Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces

Mark Drawing Code: (1) TYPED DRAWING

Filing Date: 06/20/2000

Current Basis: 44E

Original Filing Basis: 44D

Owner: (REGISTRANT) STEAG MicroTech GmbH LIMITED LIABILITY COMPANY FED REP GERMANY Carl-Benz-Strasse 10 72124 Pliezhausen FED REP GERMANY

Attorney of Record: Robert W. Becker

Type of Mark: TRADEMARK. SERVICE MARK

Register: PRINCIPAL

Live/Dead Indicator: DEAD

SiteNo: 491094

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